PVD Coating

Physical Vapour Deposition is used to deposit a metal vapour on electrically conductive materials as a thin highly adhered pure metal or alloy coating.

The process itself is performed at high vacuum in a chamber using a cathodic arc source. It is possible to apply single or multi-layer coatings to the material during a single process cycle. In addition to this process the metal vapour can be reacted with different gases to deposit Carbides, Carbonitrides, Oxides or Nitrides.